50x Plan Apo PL‑AMIi Brightfield/Darkfield Objective 0.80 NA, 1mm WD, M26 Parfocal 45mm - Euromex

Take advantage of the combination of high-resolution optics, practical compatibility and a long working distance to improve inspection throughput and image quality. Order the lens directly via Metav Werkzeuge or consult the technical advisors for integration support.

Plan Apo PL-AMIi 50x/0.80 IOS objective — long working distance 1 mm, M26 (Euromex)

The Plan Apo PL-AMIi 50x/0.80 is a high-performance brightfield/darkfield microscope objective designed for demanding inspection tasks where high resolution and reliable mechanical integration matter

• Apochromatic Plan correction for flat field
• High magnification 50x with 0.80 NA
• Long working distance 1 mm for bulky samples
• M26 thread and 45 mm parfocal for easy swapping

Exceptional optical performance for critical inspections

The 50x magnification paired with a 0.80 numerical aperture delivers a combination of resolving power and contrast that is well suited to fine-detail inspection. The apochromatic Plan design corrects chromatic and field curvature errors, which results in sharper, flatter images across the field and reduces the need for repeated focus adjustments during a series of measurements. This optical precision makes the lens particularly useful when visualising fine structures or inspecting patterned surfaces where reproducible detail is a priority.

Mechanical compatibility that keeps production moving

A 1 mm working distance provides clear practical benefits when examining thicker or uneven samples while maintaining high resolution; this is a considered compromise between proximity and sample clearance. The objective is supplied with an M26 thread and a 45 mm parfocal setting, enabling quick mounting and minimal re‑focusing when used alongside other parfocal objectives on a turret. The absence of cover‑glass correction (no cover glass correction) should be noted: the lens is optimised for direct sample observation rather than through a standard cover slip, which simplifies handling for industrial samples and fixtures.

What the optical numbers mean in everyday use

The numerical aperture describes the objective’s ability to gather light and resolve detail: a higher NA increases achievable resolution and image brightness at the expense of depth of field. In practice, the 0.80 NA of this lens yields noticeably finer detail and improved contrast under both brightfield and darkfield illumination compared with lower‑NA alternatives. The apochromatic correction further enhances colour fidelity and reduces artefacts, which simplifies image interpretation and reduces post‑processing. For operators unfamiliar with these terms, the advantage is straightforward: clearer, more reliable images with less manual correction.

Typical applications and workflow advantages

This objective is designed for industrial microscopy, quality control and research tasks where both magnification and mechanical repeatability are essential. Common uses include PCB and semiconductor inspection, metallographic examinations, and materials research where surface detail and defect detection are key. The combination of long working distance, parfocal alignment and apochromatic correction reduces set‑up time and improves throughput: components can be checked more quickly and with greater confidence in the visual results, supporting repeatable measurements and faster decision cycles.

Contact Metav Werkzeuge today for expert assistance integrating the Euromex Plan Apo PL-AMIi 50x/0.80 objective into existing microscope systems and to arrange delivery from Emmerich; call +49 2822 7131930 or email info@metav-werkzeuge.com

Technical data

• SKU: AI.8150
• Designation: Plan Apo PL-AMIi 50x/0.80 IOS objective
• Type: Objective / lens
• Manufacturer: Euromex Microscopen bv

Optical specifications

• Magnification: 50x
• Numerical aperture: 0.80
• Parfocal distance: 45 mm
• Working distance: 1 mm
• Thread: M26

Features & suitability

• Brightfield and darkfield compatibility
• No cover glass correction
• Long working distance for thicker or mounted samples
• Parfocal design for turret compatibility

FAQ

Is this objective suitable for use with cover slips?
The Plan Apo PL-AMIi 50x/0.80 is specified without cover glass correction, so it is optimised for direct sample observation rather than through a standard cover slip.

What does the 0.80 numerical aperture mean for image quality?
A 0.80 NA provides higher resolution and brightness compared with lower NA objectives; it enables finer detail to be resolved under brightfield or darkfield illumination.

Can the lens be mounted on standard microscope turrets?
Yes, the M26 thread and 45 mm parfocal distance support straightforward mounting and quick swapping with other parfocal objectives, subject to the eyepiece tube and turret design of the microscope.

Is the objective usable for both brightfield and darkfield techniques?
The optical design supports both brightfield and darkfield illumination modes, making it versatile for contrast‑based inspection methods.

Which applications are best suited to this objective?
Typical uses include industrial inspection, PCB and semiconductor examination, metallography and precision materials analysis where high magnification and reliable image flatness are required.

How does the long working distance help in practical inspections?
The 1 mm working distance offers more clearance for irregular or mounted samples while preserving high optical performance, reducing the risk of tool or sample contact during inspection.

Manufacturer: Euromex Microscopen bv, Typograaf 8, 6921 VB Duiven, The Netherlands; info@euromex.com