100mm Plan PLMi S100x/0.85 Infinity-Corrected IOS Brightfield Objective 0.4mm Working Distance - Euromex
€882.00
Product information "100mm Plan PLMi S100x/0.85 Infinity-Corrected IOS Brightfield Objective 0.4mm Working Distance - Euromex"
Take advantage of the combination of high magnification, a large numerical aperture and a short working distance for detailed, reliable material analysis; order the objective directly via Metav Werkzeuge or consult the specialists if needed.
Plan PLMi S100x/0.85 — Infinity‑corrected brightfield objective, 0.85 NA
A Plan PLMi S100x/0.85 objective designed for brightfield material‑science inspection on bScope systems, providing high‑resolution imaging without cover‑glass correction.
- 100× magnification for fine structural detail
- High 0.85 NA for superior resolution
- Infinity‑corrected design for modern optics
- 0.4 mm working distance for material science
Reveal microstructure with higher effective resolution
With 100× magnification combined with a 0.85 NA, this lens increases the effective resolving power of a microscopy setup, making fine grain boundaries, phase contrasts and defect morphologies visible with fewer exposures. A high numerical aperture translates directly into improved light‑gathering and contrast in brightfield observation, which reduces the need for repeated imaging and accelerates inspection throughput. The optical correction also maintains a flat field across the image plane, so measurements and image stitching remain consistent, supporting reliable documentation and later image analysis.
Optimised for metallurgical and material workflows
The infinity‑corrected optical design is compatible with modern microscope tube optics and intermediate components, enabling flexible system configuration within material‑science benches. The specified 0.4 mm working distance and explicit lack of cover‑glass correction indicate suitability for unmounted, polished specimens and metallographic preparations rather than routine transmitted‑light biology. This geometry helps to avoid sample interference while preserving high‑contrast imaging; as a result, inspection cycles are more predictable and sample handling is simplified for standard material‑science routines.
Consistent imaging that supports quality control processes
Engineered as a Plan objective, the lens reduces field curvature and maintains uniform sharpness from centre to edge, which benefits both manual evaluation and automated image processing. Robust optical performance reduces rework caused by ambiguous images and supports traceable results in quality control. Backed by the Euromex bScope lineage, the optic contributes to reproducible workflows and integrates into laboratories seeking straightforward upgrades to achieve finer structural detail without wholesale system replacement.
Contact Metav Werkzeuge to discuss procuring the Euromex Plan PLMi S100x/0.85 for bScope systems or to confirm compatibility with existing inspection rigs — info@metav-werkzeuge.com, +49 2822 7131930
Technical data
- SKU: BS.8100
- Type: Objective / lens
- Model series: bScope
- Label: Plan PLMi S100x/0.85 infinity‑corrected IOS objective for brightfield for bScope material science; working distance 0.4 mm; no cover glass correction
Core specifications
- Magnification: 100×
- Numerical aperture: 0.85
- Working distance: 0.4 mm
Special features
- Infinity‑corrected optical design (IOS)
- Plan field correction
- Designed for brightfield material‑science inspection
- No cover glass correction
- Euromex bScope compatibility
FAQ
What specimens are best suited to this objective?
This objective is intended for metallographic and material‑science specimens; the absence of cover‑glass correction makes the lens suitable for polished, unmounted samples examined in brightfield.
Can the lens be used on other microscope brands?
The infinity‑corrected design allows integration with microscopes that accept infinity optics; compatibility should be verified with the system tube length and intermediate optics before installation.
How does the 0.85 numerical aperture affect imaging?
A 0.85 NA provides improved light collection and finer resolution, enhancing contrast in brightfield images and enabling clearer visualisation of microstructural detail.
Is cover glass required when using this objective?
No — the objective is specified without cover‑glass correction, which is advantageous for direct inspection of metallographic samples that are not covered.
Does this objective support automated image analysis?
Yes — the Plan correction and consistent field flatness support reliable image capture for downstream automated processing and measurement routines.
Manufacturer: Euromex Microscopen bv; Typograaf 8; 6921 VB Duiven; The Netherlands; info@euromex.com