30 mm Trinocular Microscope Plan Semi-Apo/Plan Apo Objectives 5/10/20/50x, SWF 10x/25 mm Eyepieces, 45 mm Parfocal, 210x170 mm Stage with 105x105 mm Cross Stage, 100 W Transmitted and Reflected Halogen Illumination - Euromex

Benefit from a combination of high‑resolution optics, a trinocular head for imaging, and powerful 100 W halogen illumination to support material science inspection and documentation. Order the Delphi‑X Observer directly via Metav Werkzeuge or consult our specialists for configuration advice.

Delphi‑X Observer trinocular microscope with plan semi‑apo and plan apo objectives (Euromex)

The Delphi‑X Observer is a trinocular microscope engineered for material science and inspection tasks, equipped with plan semi‑apochromatic objectives and a plan apo 50x option for high‑contrast, flat‑field imaging.

• Trinocular head for camera attachment
• Plan semi‑apo and plan apo objectives
• 100 W transmitted and reflected halogen illumination
• 210 x 170 mm stage with 105 x 105 mm cross table

Precision optics for reliable material analysis

The optical assembly combines plan semi‑apo objectives at 5x, 10x and 20x with a plan apo 50x IOS objective, delivering a flat image field and high edge‑to‑edge sharpness that benefits metallography and mounted sample inspection. The EIS 45 mm parfocal system keeps specimens in focus when switching magnifications, reducing refocusing time and increasing throughput. Such optical stability translates directly into repeatable measurements and reliable documentation when assessing microstructures or surface finishes.

Stable mechanics and controlled sample movement

A purpose‑built 210 x 170 mm stage with a 105 x 105 mm cross table enables secure sample placement and fine positioning for multi‑region inspection. The robust trinocular head and steady mechanical build reduce vibration and drift during image capture or extended observation. The combination of a wide stage area and precise cross movement supports tasks where accurate positioning is essential, such as comparative imaging, defect localisation and series documentation in research or quality control environments.

Versatile illumination for transmitted and reflected work

Integrated 100 W transmitted and reflected halogen illumination provides strong, consistent light for both transparent specimens and reflective materials. The dual‑mode lighting supports brightfield observation and detailed surface inspection without additional accessories, while the SWF 10x / 25 mm eyepieces offer a wide field of view for comfortable visual scanning. Halogen light yields a continuous spectrum helpful for true colour rendition in material analysis, and the system’s configuration is suited to both visual assessment and digital capture workflows.

Imaging and documentation made straightforward

With a dedicated trinocular port, the instrument facilitates easy attachment of a camera for photomicrography and digital archiving. The wide eyepiece field and plan objectives reduce peripheral distortion, making images suitable for reporting and publication. The optical and mechanical features together promote efficiency: fewer refocusing interruptions, stable sample presentation and lighting that reproduces surface details accurately. Where traceability and reproducibility matter, this configuration supports consistent results across repeated inspections.

Contact Metav Werkzeuge for a specialist consultation on the Delphi‑X Observer’s configuration and to request detailed technical documentation from our Emmerich centre

Technical data

• Article number: DX.2053-PLMRi
• Model series: Delphi‑X Observer
• Product type: microscope
• Manufacturer: Euromex

Facts

• Head: trinocular
• Eyepieces: SWF 10x / 25 mm
• Parfocal distance: EIS 45 mm
• Stage size: 210 x 170 mm
• Cross table travel: 105 x 105 mm
• Illumination: 100 W transmitted and reflected halogen

Special features

• Plan semi‑apochromatic objectives 5x, 10x, 20x
• Plan apochromatic 50x IOS objective
• Wide field eyepieces
• Suitable for material science and inspection imaging

FAQ

What types of objectives are included and what benefit do they provide?
The system includes plan semi‑apo objectives at 5x, 10x and 20x plus a plan apo 50x IOS objective; these offer a flat field and improved chromatic correction for clearer edges and more accurate visual assessment during material analysis.

Is the microscope suitable for both transmitted and reflected sample work?
Yes, the Delphi‑X Observer features 100 W halogen illumination for both transmitted and reflected techniques, enabling examination of transparent samples and metallic or coated surfaces without additional light modules.

Can a camera be attached for photomicrography?
The trinocular configuration supports camera attachment through the dedicated phototube, allowing documented imaging and digital archiving directly from the Delphi‑X Observer.

What does the EIS 45 mm parfocal specification mean in practice?
An EIS 45 mm parfocal system keeps the specimen essentially in focus when changing between objectives, reducing the need for refocusing and improving efficiency during sequential magnification checks.

For which applications is this microscope optimised?
This configuration is optimised for material science, metallography and quality control tasks where flat‑field imaging, consistent illumination and precise stage control are required.

Manufacturer / Responsible: Euromex Microscopen bv; Typograaf 8; 6921 VB Duiven; The Netherlands; info@euromex.com