100x Plan Semiapochromatic PLM 0.80 NA Long Working Distance 2.1mm No Cover Glass Correction - Euromex

Precision imaging benefits from the combination of 100x magnification, a 0.80 numerical aperture and a 2.1 mm long working distance, delivering sharp polarised-light results even on thicker specimens; order it via Metav Werkzeuge or consult our specialists for application-specific advice.

Plan semi-apochromatic PLM 100x/0.80 LWD IOS Objective (OX.8200) — Euromex Objective / Lens

A Plan semi-apochromatic PLM 100x/0.80 LWD IOS Objective designed for high-resolution polarised-light examinations where a long working distance is required

• 100x magnification for fine detail
• 0.80 numerical aperture for resolution
• Long working distance 2.1 mm
• No cover-glass correction — direct sample use

Achieve higher contrast and resolution in polarised-light work

The plan semi-apochromatic design improves field flatness and reduces lateral chromatic aberration, so images remain sharp from centre to edge. With 100x magnification combined with a 0.80 numerical aperture, the optic delivers enhanced resolving power and better light-gathering capacity than lower-NA high-power objectives. This translates into clearer structural detail under polarised light, enabling more reliable identification of fine features in minerals, fibres and thin sections without excessive post-processing.

Work safely with thicker or uneven specimens thanks to the long working distance

A long working distance (2.1 mm) permits comfortable sample manipulation and observation of specimens that cannot be mounted beneath a thin cover slip. The extended clearance reduces the risk of contact between objective and sample, which is especially useful when examining brittle, irregular or prepared mounts. By maintaining a practical separation, the objective supports repeatable measurements and reduces downtime caused by accidental contact during positioning.

Understand the implications of no cover-glass correction

This objective is specified without cover-glass correction, which makes it well suited to direct inspection of unmounted or surface-prepared samples. The absence of cover-glass correction means optical performance is optimised when no standard #0 or #1.5 cover slip is present; for workflows that rely on conventional cover-glass thickness for refractive-index matching, an alternative corrected objective should be considered. The design choice favours laboratory and industrial polarisation tasks where samples are intentionally left uncovered or are thicker than routine slides.

Compatibility and handling for polarised-light microscopy setups

Marked IOS, the objective is compatible with infinity-corrected optical systems and integrates with polarised-light microscope stands intended for laboratory and industrial analysis. The combination of PLM suitability and a plan-corrected field makes it appropriate for applications in geology, materials science and forensic inspection. For specification checks, system compatibility or procurement, Metav Werkzeuge can provide further guidance; technical queries may be directed to info@metav-werkzeuge.com or by telephone at +49 2822 7131930.

Speak to Metav Werkzeuge for advice on integrating the Euromex objective into existing polarised-light setups and for fast availability and delivery from Emmerich

Technical Data

• Article number: OX.8200
• Product: Objective / lens
• Brand: Euromex
• Label: Plan semi-apochromatic PLM 100x/0.80 LWD IOS Objective; working distance 2.1 mm; without cover-glass correction

Facts

• Magnification: 100x
• Numerical aperture: 0.80
• Working distance: 2.1 mm

Special features

• Plan semi-apochromatic design
• PLM suitability (polarised light)
• LWD — long working distance
• IOS — infinite optical system
• No cover-glass correction

FAQ

What applications are this objective best suited for?
The Plan semi-apochromatic PLM 100x/0.80 LWD IOS Objective is tailored to polarised-light examinations in geology, materials analysis and quality control where high magnification and field flatness are required without a cover slip.

How does the 0.80 numerical aperture affect image quality?
A 0.80 numerical aperture increases resolving power and light collection compared with lower-NA objectives, improving contrast and detail visibility under PLM conditions with the Euromex objective.

Can this objective be used with standard cover slips?
This particular Euromex objective is supplied without cover-glass correction, so optical performance is optimised for uncovered or thicker specimens rather than standard cover-slip preparations.

What does LWD 2.1 mm mean for daily use?
A working distance of 2.1 mm provides safer clearance between objective and sample, allowing easier manipulation of specimens and reducing the likelihood of collision during positioning.

Is the objective compatible with infinity-corrected microscopes?
Yes; marked IOS, the objective is intended for use with infinity-corrected optical systems commonly found in modern polarised-light microscope stands.

Manufacturer: Euromex Microscopen bv, Typograaf 8, 6921 VB Duiven, Nederland, info@euromex.com